Provider of EUV turnkey light sources.

Publications

Clean and stable LPP light source for HVM inspection applications
Bob Rollinger; Nadia Gambino; Andrea Z. Giovannini; Luna S. Bozinova; Flori Alickaj; Konrad Hertig; Reza S. Abhari; Fariba Abreau
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V, 90482K. (April 17, 2014) doi: 10.1117/12.2046416
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Temporal and spatial dynamics of a laser-produced plasma through a multiple Langmuir probe detector
Nadia Gambino; Markus Brandst├Ątter; Bob Rollinger; Reza S. Abhari
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V, 90482I. (April 17, 2014) doi: 10.1117/12.2046378
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Three-Dimensional Plasma Shape Effects on the EUV Emission Distribution in Laser Droplet Interactions
Giovannini A., Abhari R.S.

Effects of the dynamics of droplet-based laser-produced plasma on angular extreme ultraviolet emission profile
Giovannini A., Abhari R.S.
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Three-Dimensional Extreme Ultraviolet Emission From A Droplet-Based Laser-Produced Plasma
Giovannini, A. Z., Abhari R.S.
2013, Journal of Applied Physics, Vol. 114, No. 3, 033303

Laser-produced plasma light source for extreme-ultraviolet lithography applications
Abhari R.S., Rollinger B., Giovannini, A., Morris, O., Henderson, I., Ellwi, S. S.
2012, Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 11, No. 2, 021114

Extreme Ultraviolet and Out-of-Band Radiation Emission from a Tin Droplet based LPP Source
Morris, O., Gambino, N., Giovannini, A., Henderson, I., Abhari R.S.
2012, Proc. SPIE Vol. 8322, Paper 8322-17

High Temperature Fast Response Pressure Probe for Use in Liquid Metal Droplet Dispensers
Rollinger, B, Mansour, M., Abhari, R. S.,
2012, Review of Scientific Instruments, Vol. 83, 065002

Tin Droplets for EUV Sources
Rollinger B., Giovannini, A., Abhari R.S.
2012, Proc. SPIE Vol. 8322, Paper 8322-98

EUV Brightness, Stability and Contamination Measurements at the Intermediate Focus Module
Giovannini A.Z., Morris O., Henderson I., Abhari R.S., Ellwi S.
2011, Proc. SPIE Vol. 7969, Paper 7969-105

High brightness EUV source for EUVL applications
Morris O., Abhari R.S.
2011, 2011 International Workshop on EUV and Soft X-ray Sources

Stable Tin Droplets for LPP EUV Sources
Rollinger B., Morris O., Abhari R.S.
2011, Proc. SPIE Vol. 7969, Paper 7969-104

The leading candidate technology for the manufacturing of the next generation semiconductor devices is extreme ultraviolet lithography (EUVL). The 13.5nm radiation (2% bandwidth) can be generated from a Laser-Produced Plasma (LPP). Tin-based LPPs formed using a high power (kW) laser, are highly emissive in this wavelength window.

A key component of EUV LPP sources is the droplet generator. Small tin droplets are mandatory for long-term operation, as they form a regenerative target. Tin droplets present high conversion efficiency (CE) and can be synchronized with the pulsed lasers used for EUVL. EUV sources are required to have stable emission. The overall source stability directly correlates with the stability of the fuel delivery system.
The main requirements for a tin droplet generator are reproducible droplet size and circularity, controllable droplet speed, droplet train stability, as well as long-term operation. Small tin droplets minimize the amount of debris by only delivering the number of radiators needed for EUV emission to the target irradiation site. The CE of an EUV source directly depends on droplet stability. Droplet stability is statistically assessed in time and space: the vertical jitter between droplets, the mean droplet train drift, as well as the deviations from the droplet train mean are studied. The long-term operation is achieved by the tin conditioning system, including refilling.

EUV Brightness Measurements and IF Imaging
Giovannini, A., Morris, O., Henderson, I., Ellwi, S., Abhari R.S.
2010, International Symposium on Extreme Ultraviolet Lithography

Novel incidence collector for LPP sources with integrated debris mitigation
Giovannini, A., Dieterich F., Henderson I., Chokani N., Abhari R.S.
2010, Proc. SPIE Vol. 7636, Paper 7636-38

Development of EUV Source Technology
Rollinger B., Giovannini, A., Morris, O., Henderson, I., Abhari R.S.
2010, International Symposium on Extreme Ultraviolet Lithography

Tin ion and neutral dynamics within an LPP EUV source
Rollinger B., Morris O., Chokani N., Abhari R.S.
2010, Proc. SPIE Vol. 7636, Paper 7636-126

Kinetic Simulation of Debris from an LPP EUV Source
Rollinger B., Giovannini, A., Bleiner D., Chokani N., Abhari R.S.
2009, Proc. SPIE Vol. 7271, 72712W (Read Abstract)

LPP EUV Source Development at ETHZ
Rollinger B., Giovannini, A., Bleiner D., Chokani N., Abhari R.S.
2009, International Workshop on EUV Lithography, Paper Source-4
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Parametric Tradeoffs in Laser Plasma Sources for EUV Lithography
Bleiner D., Rollinger B., Abhari R.S.
2008, SPIE Conference 08, No. 6921-109

Characteristics of a Minimum-debris Optimum Conversion Efficiency Tin-Based LPP Source
Rollinger B., Bleiner D., Chokani N., Abhari R.S.
2008, SPIE Conference 08, No. 6921-35