Provider of EUV turnkey light sources.

Temporal and spatial dynamics of a laser-produced plasma through a multiple Langmuir probe detector

Nadia Gambino; Markus Brandstätter; Bob Rollinger; Reza S. Abhari
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V, 90482I. (April 17, 2014) doi: 10.1117/12.2046378

At the Laboratory for Energy Conversion (LEC), ETH Zurich, droplet-based LPP-EUV light sources have been developed since 2007. The main LPP source is ALPS II, which is fully operational since more than one year. The facility is an engineering test stand for long-term e↵ect studies. In order to improve the debris mitigation techniques, it is essential to investigate the droplet plasma dynamics in time and space. Recently a new diagnostic tool based on a multiple array of motorized Langmuir probes has been constructed for this purpose. The detector has been used to map the angular and radial distribution of the ion and electron dynamics around the droplet target. In this paper, some of the experimental results obtained with the new detector are reported. The angular and radial distribution of the ion flux and kinetic energy of the droplet plasma reveals an anisotropic expansion of the ions in terms of kinetic energy and amount of ion charge around the droplet target. These results have been obtained during continuous source operation and for the first time on droplet-based laser produced plasmas.

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